Visual Photonics Epitaxy (2455) Investor presentation summary

Core technology and production process

• Specializes in MOCVD (Metal Organic Chemical Vapor Deposition) for epitaxial wafer production, enabling precise control of semiconductor film growth for products like GaAs, InP, and GaN.

• Utilizes real-time monitoring to ensure accurate stacking of atomic layers during epitaxy.

• Employs a range of chemical sources including tri-methyl-gallium, tri-methyl-indium, and hydrides for compound semiconductor fabrication.

Product and material portfolio

• Manufactures compound semiconductors across binary, ternary, quaternary, and pentanary materials, including GaAs, InP, GaN, InGaAs, and AlGaInP.

• Offers high electron mobility, high frequency response, wide bandwidth, high linearity, and anti-radiation properties, suitable for microelectronics and optoelectronics.

Industry supply chain integration

• Supplies GaAs epi-wafers for wireless communication, collaborating with substrate providers, foundries, and IC design houses.

• Provides InP epi-wafers for optoelectronic products, supporting data centers and optical transceivers.